Books

    Berlin Evgeny, Seidman Lev. "Obtaining thin films by reactive magnetron sputtering." - Moscow, Technosphere, 2014. - 256 p.

    The book is a detailed reference guide to the basics of physical, technological features and practical application of reactive magnetron deposition of thin films of complex composition such as chemical compounds of metals or semiconductors with nitrogen, oxygen or carbon. It is a detailed description of the physical processes occurring during reactive magnetron sputtering and its technological features. Particular attention is paid to methods of process control reactive magnetron deposition of thin films which provide the stability and reproducibility of both the coating process and the properties of the resulting films.

    Berlin Eugeny, Seidman Lev. "Ion-plasma processes in thin-film technology" - Moscow, Technosphere, 2010.

    This book is a comprehensive reference guide to the main vacuum plasma chemical processes in thin-film technology such as reactive magnetron thin film deposition and ion-plasma etching. The book contains a detailed description of magnetron sputtering systems and plasma chemical etching systems for thin films, the technological features of their use.

    Berlin Eugeny, Koval Nikolai, Seidman Lev. "The plasma thermochemical surface treatment of steel parts." - Moscow, Technosphere, 2012. - 464 p.
    The book is a comprehensive reference guide to the basics of plasma thermochemical surface treatment of steel parts. The book analyzes types of equipment and its design principles to achieve high performance and uniformity of treatment, variants plasma thermochemical processing.

    Berlin Eugene, Dvinin Sergei, Seidman Lev: "Vacuum technology and equipment for coating and etching of thin films." - M., Technosphere, 2007. - 176 p.
    The book summarizes the current state of one of the branches of the manufacturing of electronic equipment technology vacuum deposition and etching of thin films. The book contains a detailed description of magnetron sputtering systems, plasma chemical etching systems for thin film and the technological features of their use. It includes mathematical models, management methods and examples of reactive magnetron sputtering, the principles of construction and application of mid-range power supply for the reactive magnetron sputtering. 

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