Radio-frequency plasma generators

    High density plasma is a very useful tool for a vide range of different applications, including:

    • ionized physical vapor deposition (IPVD);
    • plasma enhanced chemical vapor deposition (PECVD);
    • plasma chemical etching;
    • ion sputtering and etching;
    • plasma nitriding and carbonitriding;
    • polishing;
    • oxide reduction.

    For these applications we offer special ICP generators. Their unique design provides outstanding efficiency and plasma density. Almost any gases including halogens, oxygen, hydrogen can be used for plasma creation. The process is not contaminated with electrodes' material. Unlimited process and life time.

    The device comes in two versions — RFPG-128 and RFPG-250 (nominal diameter of the shell). RFPG-250 can provide of ion flux with at least ±2% uniformity on a 200 mm diameter, RFPG-128 provides higher plasma densities (ion flux density up to 50 mA/cm2).


    Purpose: creation and continuous maintenance of high-density gas discharge plasma in working spaces of vacuum technological machines. RFPG-128 provides higher plasma densities (ion flux density up to 50 mA/cm2). Installation: into a view port flange or inside the vacuum chamber on a DU60 sliding seal both in new machines and when modernizing the existing ones. There are tested and tried procedures of using plasma generators in the majority of serially produced Russian plants. Application: processes of ion and plasmachemical etching,…
    Purpose: creation and continuous maintenance of high-density gas discharge plasma in working spaces of vacuum technological machines. RFPG-250 allows obtaining of ion flux with at least ±2% uniformity on a 200 mm diameter, ion flux density up to 25 mA/cm2) Installation: into a view port flange or inside the vacuum chamber on a DU60 sliding seal both in new plants and when modernizing the existing ones. There are tested and tried procedures of using plasma generators in the majority of…