Linear magnetrons

    Rectangular targetssize may have 145-800 mm on 80-100 mm. The targets' thikness may be up to 20 mm.

    Purpose: efficient sputtering of targets made of conductive materials by ion bombardment in plasma of an abnormally glowing discharge, metals, alloys and dielectrics depositing in a reactive mode.

    Versions: ordinary, ultrafast, with a traveling magnetic system, in a sealed housing, high-frequency.

    Processes:

    • Magnetron sputtering of metals and alloys retaining the original composition;

    • thermal evaporation in a magnetron discharge;

    • reactive evaporation of dielectrics.

    Installation: on a sliding seal, on a flange, on a Du5 bellows lead.

    Parameter

    Magnetron-800

    Magnetron-600

    Magnetron-400

    Magnetron-145

    Operating voltage, V

    300..800

    Operation pressure, Pa

    0.07..10

    Target shape

    rectangular

    Maximum target thickness, mm

    20

    20

    20

    12

    Target width, mm

    80

    Target length, mm

    800

    600

    400

    145

    Power consumption, W

    20000

    18000

    12000

    3500

    Weight, kg

    20

    15

    10

    3,5