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    Linear Ion Beam Sources

    Gas-discharge ion sources generating linear beams. High uniformity of ion flux distribution along the source makes it the optimum choice for substrate treatment on a drum or a carrousel. 

    The device has three standard size: -145, -400, -600. Also we can manufacture linear ion beam sources on request.

    Processes:

    • sputtering of materials from dielectric and conductive targets;

    • magnetron sputtering assistance;

    • ion cleaning, etching;

    • polishing;

    • plasma-enhanced chemical vapor deposition (PECVD);

    • surface modification.

    Parameter

    IBS-145

    IBS-400

    IBS-600

    Supply voltage, kV

    1.5..5

    Maximum beam current, mA*

    300

    650

    1000

    Gas efficiency, mA/sccm*

    9

    Beam shape

    Flat hollow rectangular

    Beam dimensions, LxW, mm

    120х42

    375x42

    575x42

    Beam angle, maximum, º

    2

    Operating pressure range in the chamber, Pa

    0.001..10

    Plasma-forming gases

    Ar, H2, He, Xe, O2, N2, Ne, CxHy, CO2, CxFy


    *plasma-forming gas at 3 kV supply voltage: Ar


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