Technology & Equipment
Nika-2012 SeriesNika-2012 Series is a modern version of UVN-71 series hood-type machines. Includes the following basic typical configurations: sputtering machines Ion-Beam Sputtering, Resistive Layer Deposition, Conductive Layer Deposition, Plasma Etching, Thermal Spraying and plasma-enhanced chemical machines Magnetron Sputtering/Magnetron Etching. Short production cycle, full automation, high efficiency, compact size, for industrial applications, research and educational purposes.
About usLaboratory of Vacuum Technologies develops and produces vacuum equipment for coating deposition. Newest technical concepts, high reliability and capacity, as well as reasonable prices and compact sizes are distinguishing features of our machines. Nika-2012, Nika-2013, and Nika-2014 are vacuum process units for surface coating and ion-plasma surface treatment, easily customizable for specific industrial or research tasks, fully automated.
RF Plasma GeneratorsAn electrodeless plasma of an inductive RF discharge is a universal medium for implementing a wide range of technological processes, including ion and plasmachemical etching, materials deposition (both pure metals and compositions), plasma surface treatment (polishing, nitriding, carbonization, etc.) and many other. We has developed two types of plasma generators with different size. RFPG-250 is designated firstly for producing a large area homogeneous ion flow. RFPG-128 allows to concentrate the same inpout power in much smaller volume and to get substantialy higher plasma densities with less uniformity.
MagnetronsMagnetrons Sputtering Systems are intended for deposition of various materials: metals, alloys and dielectrics in reactive mode. We produce both circular and linear magnetrons for sputtering of dielectric targets with radio-frequency supply and ferromagnetic targets by use of a special magnetic system. Versions: ordinary, ultrafast, with a traveling magnetic system, in a sealed housing, with a built-in lid and drive, high-frequency.
- BUVS-U Universal Vacuum System Control Unit Saturday, 27 December 2014 07:57 Be the first to comment! Read more...
- IBS-52 Circular Ion Beam Source Saturday, 27 December 2014 07:38 Be the first to comment! Read more...
- Nika-2012 PS Conductive Layers Deposition Machine (CLD) Sunday, 12 April 2015 14:04 Be the first to comment! Read more...